Analysis systems

Big 449-multichamber-uhv-system

Family of Analysis systems

1. XPS

2. NAP-XPS
3. ARPES
4. FTIR

5. AFM
6. ISS
7. ARUPS

8. ...

PREVAC is a world leader in the manufacture of UHV scientific research and investigation instruments on the chemical and physical properties of semiconductor surfaces, thin layers and nanomaterials. PREVAC also designs customized deposit and analysis systems. In addition, PREVAC offers a wide range of components: emission sources (ions, electrons, X / UV / thermal rays), conditioning chambers, sample transfer and handling. PREVAC systems and components are installed worldwide.

Vacuum analysis

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UPS XPS system
Big 511-xps-ups-system-ea15-rmc50
ARPES UHV system
Big 418-arpes-system
UHV multi-chamber system
Big 422-uhv-multichamber-system-with-ln2-ir-spectroscopy-mbe-chamber
PREVAC's range of surface analysis systems is based on an extremely flexible analysis tool, optimized for XPS (ESCA), UPS, ISS and AES measurements. The energy resolution of the hemispherical analyzer is <3 meV (FWHM at 2 eV energy of passage). In addition to the spectrometer, versatile monitoring software is provided. It stores data in an open standard format (JSON) and allows data to be exported in various other formats (hdf5, ini, txt), used by different standalone XPS evaluation programs.

Analysis chamber - in μ-metal, with connection flanges for current and subsequent equipment. Basic pressure range 10-10 mbar (after cooking at 150 ºC),

  • EA15 hemispherical energy analyzer - equipped with a total number of 11 slots, the analyzer offers the possibility of choosing between the best energy resolution and the best intensity. Average radius: 150 mm. Kinetic energy range: 0-2000 eV,
  • X-ray source RS 40B1 - high intensity double anode X-ray source,
  • X-ray source with RMC50 monochromator with electronic assembly (emission controller, cooling box and high-voltage power supply for the operation of the RMC50 and RS40B1 x-ray sources),
  • UV source UVS 40A2,
  • RUDI-EA2 - highly stable and low noise electronics,
  • SPECTRIUM - a progressive and optimized software tool for manipulation and intuitive graphical interface,
  • 4-5-6 axes, fully motorized UHV manipulator (with heating and cooling),
  • Pumping system for analysis chamber and analysis components,
  • Gas dosing system for the analysis chamber.

The analysis chamber with mu-metal lining guarantees a residual magnetic field of less than 0.1 microTesla and a basic pressure range of 5 * 10-11 mbar including:

  • Closed cycle High resolution manipulator with LHe cooling (sample temperature below 15 K) - fully motorized
  • Optimized for high demand applications, high precision ARPES electron analyzer
  • Monochromatic UV source for measuring the inverter with dedicated pumping system

Loading chamber can load up to 12 flag-style sample holders
The preparation chamber mounted on top of the analysis chamber, which allows the use of a manipulator for the two chambers, includes:

  • Ion spray source for cleaning samples
  • Deposition rate measurement system: quartz balance and thickness monitor
  • Gold evaporator (effusion cell)
  • LEED with multichannel plate for Leed / Auger measurement

Storage chamber with parking mechanism for 12-flag style sample holder

The radial distribution chamber (UFO) for transferring the samples is transferred between the chambers under UHV pressures

Accessories:

  • Set of dedicated multifunctional multi-material sample holders
  • Special rack for all electronic units
  • Special cooking system

Multi-technical UHV system for FTIR surveys, equipped with an MBE chamber and a preparation module.

IR chamber for infrared measurement under vacuum conditions:

  • Potassium bromide glass port system prepared for use with Bruker Optics Inc. infrared spectrometers
  • The high-precision 4-axis manipulator with LN2 cooling and EB heating up to 2000 ° C allows measurements to be made in reflection and in transmission
  • Ion spray source for cleaning samples
  • The high precision infrared vacuum spectrometer with dedicated frame allows
  • Gas dosing system
  • Wide range pressure regulation system (1 mbar -10-10 mbar)

Two-level preparation chamber for non-organic materials:

  • High precision 4-axis manipulator with LN2 cooling and EB heating up to 2000 ° C
  • Ion spray source for cleaning samples
  • Atomic hydrogen source
  • LEED optics - AUGER
  • TDS thermal desorption spectrometer

The radial distribution chamber (UFO) for transferring the samples is transferred between the chambers under UHV pressures

Load Lock chamber allows loading of the PTS sample holder

Storage chamber with parking mechanism for 6 PTS sample holders

Accessories:

  • Set of dedicated multifunctional multi-material sample holders
  • Special rack for all electronic units
  • Special cooking system
  • Spare parts

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